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ASML PAS 5500 300二手翻新光刻機(jī)
專業(yè)翻新改造ASML光刻機(jī),現(xiàn)貨供應(yīng)ASML PAS 5500 300/350C/750F/850C/8TFH-A/100D/275D/450F/400D/400B/1150C,ASML TWINSCAN AT 850B/AT 850C/AT 1150C/XT 860M/XT 1060K/XT 1460K/XT 1700Fi/XT 1250D/XT 1700Gi等各種型號(hào)光刻機(jī),歡迎來電咨詢。
產(chǎn)品描述
Description
The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production
using mature 248-nm KrF technology. It combines the imaging power of the improved
0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system
and the AERIAL II illumination technology including QUASAR, multipole illumination
and optional multiple exposure capability.The system is equipped with both TTL
alignment and ATHENA for improved alignment accuracy on backend process layers,
providing a long term single machine overlay of less than 25 nm.
Further reduction of overhead times in combination with enhancements in productivity
on customer jobs provide a production throughput of 130 200-mm wph.
The application of a 2 kHz 20W KrF laser with Variable laser Frequency Control results
in the lowest possible Cost of Operation.
Key Features and Benefits
Variable, 0.7 NA Deep UV Projection Lens
Production resolution down to 130 nm.
Step and Scan
Large field size, better CD control and lower lens aberrations.
AERIAL II Illumination with QUASAR and Optional Multiple Exposure Capability
Provides the ultimate flexibility in illumination modes at maximum throughput.
PAS 5500 Step-and-Scan Body
Commonality with i-line and 193-nm Step-and-Scan tools for economic mix-and-match.
8-Spot Level Sensor
Improved focus and leveling under production conditions.
ATHENA Advanced Alignment
Increased alignment accuracy process latitude.
Includes 2kHz 20W KrF Laser Technology with VariableLaser Frequency Control
The perfect combination of high laser power for high throughput and efficient use of
laser pulses for the lowest possible laser Cost of Operation.