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Description

The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production

using mature 248-nm KrF technology. It combines the imaging power of the improved

0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system

and the AERIAL II illumination technology including QUASAR, multipole illumination

and optional multiple exposure capability.The system is equipped with both TTL alignment 、

and ATHENA for improved alignment accuracy on backend process layers, providing a long

term single machine overlay of less than 25 nm.

Further reduction of overhead times in combination with enhancements in productivity on

customer jobs provide a production throughput of 130 200-mm wph.

The application of a 2 kHz 20W KrF laser with Variable laser Frequency Control results in the

lowest possible Cost of Operation.

Key Features and Benefits

Variable, 0.7 NA Deep UV Projection Lens

Production resolution down to 130 nm.

Step and Scan

Large field size, better CD control and lower lens aberrations.

AERIAL II Illumination with QUASAR and Optional Multiple Exposure Capability

Provides the ultimate flexibility in illumination modes at maximum throughput.

PAS 5500 Step-and-Scan Body

Commonality with i-line and 193-nm Step-and-Scan tools for economic mix-and-match.

8-Spot Level Sensor

Improved focus and leveling under production conditions.

ATHENA Advanced Alignment

Increased alignment accuracy process latitude.

Includes 2kHz 20W KrF Laser Technology with VariableLaser Frequency Control

The perfect combination of high laser power for high throughput and efficient use of l

aser pulses for the lowest possible laser Cost of Operation.