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ASML PAS 5500 275D二手翻新光刻機


專業(yè)翻新改造ASML光刻機,現(xiàn)貨供應(yīng)ASML PAS 5500 300/350C/750F/850C/8TFH-A/100D/275D/450F/400D/400B/1150C,ASML TWINSCAN AT 850B/AT 850C/AT 1150C/XT 860M/XT 1060K/XT 1460K/XT 1700Fi/XT 1250D/XT 1700Gi等各種型號光刻機,歡迎來電咨詢。

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產(chǎn)品描述

Description

The PAS 5500/275D is an i-line stepper stretching resolution down to 0.28 μm and beyond.

It is built on the success of the proven PAS 5500/250C advanced i-line stepper.

The PAS 5500/275D features improved imaging achieved by applying the latest techniques

in lens adjustment as well as improved overlay by including phase modulation in the system.

In addition to that, Image Quality Control is included as standard.

Leadership productivity is improved to more than 100 wph (ATP settings).

The PAS 5500/275D uses an AERIAL illuminator, which provides flexible and

automated NA/sigma combinations in both conventional and off-axis illumination

modes while maintaining high intensities to enable economical mass production of

leading-edge devices.

Key Features and Benefits

Variable, High-NA i-line Lens

Production resolution down to 0.28 μm.

Innovative 3.5-kW AERIAL Illuminator

Maximum throughput over partial coherence and annular range.

Continuously variable partial coherence and annular illumination using AERIAL Optics

Process latitude optimization for different process layers.

Software-controlled Lens NA and Illuminator

Flexible automated imaging optimization in production settings.

Focused Reticle Masking System

Maximizes available reticle area.

Direct Reticle-referenced, Through-The-Lens (TTL) Phase-grating Alignment

Optimum overlay and matching using alignment beam phase modulation.

Advanced High Speed Stage

Precision with high throughput.

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